1. Gritsenko, V. A.; Xu, J. B.; Kwok, R. W. M.; Ng, Y. H.; Wilson, I. H., Short range order and the nature of defects and traps in amorphous silicon oxynitride governed by the Mott rule. Physical Review Letters 1998, 81, (5), 1054-1057.
2. Ding, W. Y.; Li, L.; Zhang, L. N.; Ju, D. Y.; Peng, S.; Chai, W. P., An XPS study on the chemical bond structure at the interface between SiOxNy and N doped polyethylene terephthalate. Journal of Chemical Physics 2013, 138, (10), 104706.
3. Kuiper, A. E. T.; Willemsen, M. F. C.; Vanijzendoorn, L. J., Hydrogen incorporation in silicon (oxy)nitride thin-films. Applied Physics Letters 1988, 53, (22), 2149-2151.
4. Habraken, F.; Kuiper, A. E. T., Silicon nitride and oxynitride films. Materials Science & Engineering R-Reports 1994, 12, (3), 123-175.
5. Renlund, G. M.; Prochazka, S.; Doremus, R. H., Silicon oxycarbide glasses: Part II. Structure and properties. Journal of Materials Research 1991, 6, (12), 2723-2734.
6. Pantano, C. G.; Singh, A. K.; Zhang, H. X., Silicon oxycarbide glasses. Journal of Sol-Gel Science and Technology 1999, 14, (1), 7-25.
7. Soraru, G. D.; Modena, S.; Guadagnino, E.; Colombo, P.; Egan, J.; Pantano, C., Chemical durability of silicon oxycarbide glasses. Journal of the American Ceramic Society 2002, 85, (6), 1529-1536.
8. Walter, S.; Soraru, G. D.; Bréquel, H.; Enzo, S., Microstructural and mechanical characterization of sol gel-derived Si–O–C glasses. Journal of the European Ceramic Society 2002, 22, (13), 2389-2400.
9. Bunnage, M. E., Getting pharmaceutical R&D back on target. Nature Chem. Bio. 2011, 7, 335–339.
10. Walther, M.; Möhl, W.; Danielzik, B.; Kuhr, M.; Hochhaus, R. Plasma CVD system with an array of microwave plasma electrodes and plasma CVD process. 1998.
11. Talneau, A.; Pantzas, K.; Durnez, A.; Patriarche, G.; Alamarguy, D.; Le Bourhis, E., An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon. Microelectronic Engineering 2016, 162, 40-44.
12. Dingemans, G.; van Helvoirt, C. A. A.; Pierreux, D.; Keuning, W.; Kessels, W. M. M., Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties. Journal of the Electrochemical Society 2012, 159, (3), H277-H285.
13. Klause, M.; Rothhaar, U.; Bicker, M.; Ohling, W., Dissolution of thin SiO2-coatings – Characterization and evaluation. J. Non Cryst. Sol. 2010, 356, (3), 141-146.
14. Calderón-Guillén, J. A.; Avilés-Arellano, L. M.; Pérez-Robles, J. F.; González-Hernández, J.; Ramos-Ramı́rez, E., Dense silica-based coatings prepared from colloidal silica. Surf. Coat. Techn. 2005, 190, (1-3), 110–114.
15. Hegemann, D.; Vohrer, U.; Oehr, C.; Riedel, R., Deposition of SiOx films from O2/HMDSO plasmas. Surf. Coat. Techn. 1999, 116–119, 1033–1036.
16. Delperier, B.; Vinante, C.; Morancho, R., Analysis and modeling of tetraethoxysilane pyrolysis. Journal of Analytical and Applied Pyrolysis 1988, 13, (1-2), 141-149.
17. Desu, S. B., Decomposition chemistry of tetraethoxysilane. J. Amer. Cer. Soc. 1989, 72, (9), 1615–1621.
18. Zanotti, L.; Rojas, S.; Doghieri, F.; Santarelli, F., Process characterization of LPCVD TEOS-Ozone based SiO2 films. Journal De Physique Iv 1993, 3, (C3), 337-343.
19. Juarez, H.; Pacio, M.; Diaz, T.; Rosendo, E.; Garcia, G.; Garcia, A.; Mora, F.; Escalante, G., Low temperature deposition: properties of SiO2 films from TEOS and ozone by APCVD system. J. Phys. Conf. series 2009, 167, 012020.
20. Nieto, J. P.; Jeannerot, L.; Caussat, B., Modelling of an industrial moving belt chemical vapor deposition reactor forming SiO2 films. Chem. Eng. Sci. 2005, 60, (19), 5331-5340.
21. Shareef, I. A.; Rubloff, G. W.; Bill, W. N., Role of gas phase reactions in subatmospheric chemical-vapor deposition ozone/TEOS processes for oxide deposition. J Vac Sci Technol B 1996, 14, (2), 772-774.
22. Pavalescu, C.; Kleps, I., Activation energies in chemical vapor deposition kinetics of SiO2 films using TEOS chemistry. Thin Solid Films 1990, 190, L1-L3.
23. Van der Vis, M. G. M.; Cordfunke, E. H. P.; Konings, R. J. M., The thermodynamics properties of TEOS and an infrared study of its thermal decomposition. J. Phys. IV 1993, 3, 75-82.
24. Olsson, E.; Menzel, C.; Johansson, C.; Andersson, R.; Koch, K.; Jarnstrom, L., The effect of pH on hydrolysis, cross-linking and barrier properties of starch barriers containing citric acid. Carbohydrate Polymers 2013, 98, (2), 1505-1513.
25. Batocki, R. G. S.; Mota, R. P.; Honda, R. Y.; Santos, D. C. R., Amorphous silicon carbonitride films modified by plasma immersion ion implantation. Vacuum 2014, 107, 174–177.
26. Park, E. K.; Kim, S.; Heo, J.; Kim, H. J., Electrical evaluation of crack generation in SiNx and SiOxNy thin-film encapsulation layers for OLED displays. Appl. Surf. Sci. 2016, 370, 126–130.
27. Temple-Boyer, P.; Hajji, B.; Alay, J. L.; Morante, J. R.; Martinez, A., Properties of SiOxNy films deposited by LPCVD from SiH4/N2O/NH3 gaseous mixture. Sensors and Actuators 1999, 74, (1-3), 52-55.
28. Semmache, B.; Lemiti, M.; Chanelibre, C.; Dubois, C.; Sibai, A.; Canut, B.; Laugier, A., Silicon nitride and oxynitride deposition by RT-LPCVD. Thin Solid Films 1997, 296, 32-36.
29. Pandey, R. K.; Patil, L. S.; Bange, J. P.; Patil, D. R.; Mahajan, A. M.; Patil, D. S.; Gautam, D. K., Growth and characterization of SiON thin films by using thermal-CVD machine. Optical Materials 2004, 25, 1–7.
30. Vamvakas, V. E.; Davazoglou, D.; Vahlas, C., Thermodynamic study, compositional and electrical characterization of LPCVD SiO2 films grown from TEOS/N2O mixtures. Microelectronics Reliability 1998, 38, (2), 265-269.
31. Davazoglou, D.; Vamvacas, V. E.; Vahlas., C., Thermodynamic study, composition and microstructure of silicon dioxide thin films grown by low pressure chemical vapor deposition from TEOS/N2O mixtures. J. Electroch. Soc. 1998, 145, (4), 1310-1317.
32. Vahlas, C.; Vamvakas, V.; Davazoglou, D., Low pressure chemical vapor deposition from TEOS-NH3 mixtures: Thermochemical study of the process considering kinetic data. Microelectronics Reliability 1999, 39, (2), 303-309.
33. Vamvakas, V. E.; Davazoglou, D.; Berjoan, R.; Schamm, S.; Vahlas, C., Thermodynamic study and characterization of low pressure chemically vapor deposited silicon oxynitride films from tetraethylorthosilicate, dichlorosilane and ammonia gas mixtures. Microelec. Reliability 2003, 429, 77–83.
34. Vasquez, R. P.; Madhukar, A., A kinetic-model for the thermal nitridation of SiO2/Si. Journal of Applied Physics 1986, 60, (1), 234-242.
35. Lassegue, P. Oxydation en lit fluidisé et dépôt de métaux par CVD en lit fluidisé sur nanotubes de carbone multi-parois – Application à l’industrie aéronautique. INP Toulouse, Toulouse, 2016.
36. Grill, A., Plasma enhanced chemical vapor deposited SiCOH dielectrics: from low-k to extreme low-k interconnect materials. Journal of Applied Physics 2003, 93, (3), 1785-1790.
37. Wei, Y. S.; Liu, W. Y.; Wu, H. M.; Chen, K. S.; Cech, V., Characteristics of SiOx-containing hard film prepared by low temperature plasma enhanced chemical vapor deposition using hexamethyldisilazane or vinyltrimethylsilane and post oxygen plasma treatment. Materials Chemistry and Physics 2017, 189, 183-190.
38. Wrobel, A. M.; Uznanski, P.; Walkiewicz-Pietrzykowska, A., Silicon Oxycarbide Films Produced by Remote Microwave Hydrogen Plasma CVD using a Tetramethyldisiloxane Precursor: Growth Kinetics, Structure, Surface Morphology, and Properties. Chemical Vapor Deposition 2015, 21, (10-12), 307-318.
39. Bois, L.; Maquet, J.; Babonneau, F.; Bahloul, D., Structural Characterization of Sol-Gel Derived Oxycarbide Glasses. 2. Study of the Thermal Stability of the Silicon Oxycarbide Phase. Chemistry of Materials 1995, 7, (5), 975-981.
40. Bois, L.; Maquet, J.; Babonneau, F.; Mutin, H.; Bahloul, D., Structural Characterization of Sol-Gel Derived Oxycarbide Glasses. 1. Study of the Pyrolysis Process. Chemistry of Materials 1994, 6, (6), 796-802.
41. Shen, Q.; MacDonald, L. S. Silicon carbide precursor. 2004.
42. Gallis, S.; Nikas, V.; Huang, M.; Eisenbraun, E.; Kaloyeros, A. E., Comparative study of the effects of thermal treatment on the optical properties of hydrogenated amorphous silicon-oxycarbide. J. Appl. Phys. 2007, 102, 024302.
43. Gallis, S.; Nikas, V.; Eisenbraun, E.; Huang, M.; Kaloyeros, A. E., On the effects of thermal treatment on the composition, structure, morphology, and optical properties of hydrogenatedamorphous silicon-oxycarbide. J. Mat. Res. 2009, 24, (8), 2561-2573.
44. Massiot, D.; Messinger, R. J.; Cadars, S.; Deschamps, M.; Montouillout, V.; Pellerin, N.; Veron, E.; Allix, M.; Florian, P.; Fayon, F., Topological, Geometric, and Chemical Order in Materials: Insights from Solid-State NMR. Acc. Chem. Res. 2013, 46, (9), 1975–1984.
45. Hiet, J.; Deschamps, M.; Pellerin, N.; Fayon, F.; Massiot, D., Probing chemical disorder in glasses using silicon-29 NMR spectral editing. Phys.chem.Chem.Phys.etche 2009, 11, (32), 6935-6940.
46. Etchepare, P.-L.; Vergnes, H.; Samélor, D.; Sadowski, D.; Caussat, B.; Vahlas, C., Modelling of a DLI MOCVD process to coat by alumina the inner surface of bottles. Surf. Coat. Technol. 2015, 275, 167–175.
47. Rahoui, S.; Turq, V.; Bonino, J. P., Effect of thermal treatment on mechanical and tribological properties of hybrid coatings deposited by sol-gel route on stainless steel. Surface & Coatings Technology 2013, 235, 15-23.
48. Lavollee, C.; Gressier, M.; Garcia, J.; Sobrino, J. M.; Reby, J.; Menu, M. J.; Rossi, S.; Fedel, M., New architectured hybrid sol-gel coatings for wear and corrosion protection of low-carbon steel. Progress in Organic Coatings 2016, 99, 337-345.
49. Etchepare, P.-L.; Vergnes, H.; Samélor, D.; Sadowski, D.; Brasme, C.; Caussat, B.; Vahlas, C., Amorphous alumina coatings on glass bottles using direct liquid injection MOCVD for packaging applications. Adv. Sci. Techn. 2014, 91, 117-122.
50. Etchepare, P.-L.; Baggetto, L.; Vergnes, H.; Samélor, D.; Sadowski, D.; Caussat, B.; Vahlas, C., Process-structure-properties relationship in direct liquid injection chemical vapor deposition of amorphous alumina from aluminum tri-isopropoxide. Phys. Stat. Sol. C 2015, 12, (7), 944-952.
51. Etchepare, P.-L.; Baggetto, L.; Vergnes, H.; Samélor, D.; Sadowski, D.; Caussat, B.; Vahlas, C., Direct liquid injection chemical vapor deposition of amorphous alumina from aluminum tri-isopropoxide: thin film process, structure and properties. Adv. Mater. Interf. 2016, 3, (8), 1600014.
52. Samélor, D.; Aufray, M.; Lacroix, L.; Balcaen, Y.; Alexis, J.; Vergnes, H.; Poquillon, D.; Beguin, J. D.; Pébère, N.; Marcelin, S.; Caussat, B.; Vahlas, C., Mechanical and surface properties of chemical vapour deposited protective aluminium oxide films on TA6V alloy. Adv. Sci. Techn. 2010, 66, 66-73.
53. Samélor, D.; Lazar, A. M.; Aufray, M.; Tendero, C.; Lacroix, L.; Béguin, J. D.; Caussat, B.; Vergnes, H.; Alexis, J.; Poquillon, D.; Pébère, N.; Gleizes, A.; Vahlas, C., Amorphous alumina coatings : processing, structure and remarkable barrier properties. J. Nanosci. Nanotech. 2011, 11, (9), 8387-8391.
54. Vahlas, C.; Caussat, B.; Gladfelter, W. L.; Senocq, F.; Gladfelter, E. J., Liquid and solid precursor delivery systems in gas phase processes. Recent Patents on Complex Metallic Alloys 2015, 8, 91-108.
55. Vahlas, C.; Caussat, B.; Senocq, F.; Gladfelter, W. L. Dispositif de fourniture de vapeurs d’un précurseur solide à un appareil de traitement. WO2006058895, 2006.
56. Vahlas, C.; Caussat, B.; Senocq, F.; Gladfelter, W. L.; Aloui, L.; Moersch, T., An original device for the delivery of vapors to a deposition apparatus based on the sublimation in a fluidized bed. Chem. Vap. Dep. 2007, 13, (2-3), 123-129.
57. Vahlas, C.; Caussat, B.; Senocq, F.; Gladfelter, W. L.; Sarantopoulos, C.; Toro, D.; Moersch, T. In Fluidized bed as a solid precursor delivery system in a chemical vapor deposition reactor., Proceedings of the 15th European Conference on Chemical Vapor Deposition, Bochum, Germany, 2005; Devi, A.; R. Fischer, R.; Parala, H.; Allendorf, M. D.; Hitchman, M. L., Eds. The Electrochemical Soc.: Bochum, Germany, 2005; pp 221-228.
58. Vahlas, C.; Caussat, B.; Serp, P.; Angelopoulos, G. N., Principles and applications of CVD powder technology. Mat. Sci. Eng. R 2006, 53, 1-72.
59. Vahlas, C.; Guillon, H.; Senocq, F.; Caussat, B.; Bonnafous, S., Solvent-free method for intense vaporization of solid molecular and inorganic compounds. Gases & Instrumentation 2009, January/February, 20-23.
60. Vahlas, C.; Juarez, F.; Feurer, R.; Serp, P.; Caussat, B., Fluidization, spouting, and metalorganic chemical vapor deposition of platinum group metals on powders. Advanced Mater. CVD 2002, 8, (4), 127-144.
61. Vergnes, H.; Samelor, D.; Gleizes, A.; Vahlas, C.; Caussat, B., Local kinetic modeling of aluminium oxide MetalOrganic Chemical Vapor Deposition from aluminium tri-isopropoxide. Chem. Vap. Dep. 2011, 17, (7-9), 181–185.
62. Baggetto, L.; Sarou-Kanian, V.; Florian, P.; Gleizes, A. N.; Massiot, D.; Vahlas, C., Atomic Scale Structure of Amorphous Aluminum Oxyhydroxide, Oxide and Oxycarbide Films Probed by Very High Field 27Al Nuclear Magnetic Resonance. Phys.Chem.Chem.Phys. in press, DOI: 10.1039/c6cp07937g.
63. Sarou-Kanian, V.; Gleizes, A. N.; Florian, P.; Samelor, D.; Massiot, D.; Vahlas, C., Temperature-Dependent 4-, 5- and 6-Fold Coordination of Aluminum in MOCVD-Grown Amorphous Alumina Films: A Very High Field Al-27-NMR study. J. Phys. Chem. C 2013, 117, (42), 21965-21971.
64. Vogt, K. W.; Houston, M.; Ceiler, M. F.; Roberts, C. E.; Kohl, P. A., Improvment in dielectric properties of low-temperature PECVD silicon dioxide by reaction with hydrazine. Journal of Electronic Materials 1995, 24, (6), 751-755.
65. Vogt, K. W.; Kohl, P. A.; Abys, J. A., Nitridation and CVD reactions with hydrazine. Aiche Journal 1995, 41, (10), 2282-2291.
66. Duminica, F. D.; Maury, F.; Hausbrand, R., N-doped TiO2 coatings grown by atmospheric pressure MOCVD for visible light-induced photocatalytic activity. Surf. Coat. Techn. 2007, 201, 9349–9353.
67. Smirnova, T. P.; Badalian, A. M.; Yakovkina, L. V.; Kaichev, V. V.; Bukhtiyarov, V. I.; Shmakov, A. N.; Asanov, I. P.; Rachlin, V. I.; Fomina, A. N., SiCN alloys obtained by remote plasma chemical vapour deposition from novel precursors. Thin Solid Films 2003, 429, (1-2), 144-151.
68. Smirnova, T. P.; Badalyan, A. M.; Borisov, V. O.; Yakovkina, L. V.; Kaichev, V. V.; Shmakov, A. N.; Nartova, A. V.; Rakhlin, V. I.; Fomina, A. N., Microstructure and chemical bonding in silicon carbonitride films synthesized by plasma enhanced chemical vapor deposition. Journal of Structural Chemistry 2003, 44, (1), 169-173.
69. Smirnova, T. P.; Badalyan, A. M.; Yakovkina, L. V.; Shmakov, A. N.; Asanov, I. P.; Borisov, V. O., Composition and structure of films deposited from silyl derivatives of asymmetrical dimethylhydrazine. Inorganic Materials 2003, 39, (2), 117-122.
70. Hellmann, R.; Cotte, S.; Cadel, E.; Malladi, S.; Karlsson, L. S.; Lozano-Perez, S.; Cabié, M.; Seyeux, A., Nanometre-scale evidence for interfacial dissolution–reprecipitation control of silicate glass corrosion. Nat. Mater. 2015, 14, 307-311.
71. Chollon, G.; Hany, R.; Vogt, U.; Berroth, K., A silicon-29 MAS–NMR study of α-silicon nitride and amorphous silicon oxynitride fibres. J. Eur. Cer. Soc. 1998, 18, (5), 535-541.
72. Cataldo, F.; Capitani, D.; Proietti, N.; Ragni , P., Radiolyzed amorphous silica: A study with 29Si CP-MAS NMR spectroscopy. Radiation Physics and Chemistry 2008, 77, 267–272.
73. Rossini, A. J.; Zagdoun, A.; Lelli, M.; Gajan, D.; Rascón, F.; Rosay, M.; Maas, W. E.; Copéret, C.; Lesage, A.; Emsley, L., One hundred fold overall sensitivity enhancements for Silicon-29 NMR spectroscopy of surfaces by dynamic nuclear polarization with CPMG acquisition. Chemical Science 2012, 3, (1), 108-115.
74. Iacocca, R. G.; Allgeier, M., Corrosive attack of glass by a pharmaceutical compound. J. Mat. Sci. 2007, 42, (3), 801-811.
75. Iacocca, R. G.; Toltl, N.; Allgeier, M.; Bustard, B.; Dong, X.; Foubert, M.; Hofer, J.; Peoples, S.; Shelbourn, T., Factors Affecting the Chemical Durability of Glass Used in the Pharmaceutical Industry. AAPS PharmSciTech 2010, 11, (3), 1340-1349.
76. Hunt, D., Evaluation of the inner surface durability of glass containers. In <1660>, Dabosi, F., Ed. 2012.
77. Etchepare, P.-L. Revêtements barrière d’alumine amorphe appliqués à l’intérieur de flacons pharmaceutiques en verre par le procédé de dépôt chimique en phase vapeur. INPT, 2015.
78. Oliver, W. C.; Pharr, G. M., An improved technique for determining hardness and elastic-modulus using load and displacement sensing indentation experiments. Journal of Materials Research 1992, 7, (6), 1564-1583.
79. Attar, F.; Johannesson, T., Adhesion evaluation of thin ceramic coatings on tool steel using the scratch testing technique. Surface & Coatings Technology 1996, 78, (1-3), 87-102.
80. Liao, N. B.; Zhang, M.; Zhou, H. M.; Xue, W., Modeling of amorphous SiCxO6/5 by classical molecular dynamics and first principles calculations. Scientific Reports 2017, 7, 42705hanni.
81. Hanninen, T.; Schmidt, S.; Wissting, J.; Jensen, J.; Hultman, L.; Hogberg, H., Stoichiometric silicon oxynitride thin films reactively sputtered in Ar/(NO)-O-2 plasmas by HiPIMS. J. Phys. D: Appl. Phys. 2016, 49, (13), 135309.
82. Zambom, L. D. S.; Verdonck, P., Deposition of silicon oxynitride at room temperature by Inductively Coupled Plasma-CVD. Thin Solid Films 2006, 515, (2), 596-598.
83. Sharma, S. K.; Barthwal, S.; Singh, V.; Kumar, A.; Dwivedi, P. K.; Prasad, B.; Kumar, D., PECVD based silicon oxynitride thin films for nano photonic on chip interconnects applications. Micron 2013, 44, 339-346.
84. Chen, C.; Tao, T.; Qi, W.; Zeng, H.; Wu, Y.; Liang, B.; Yao, Y.; Lu, S.; Chen, Y., High-performance lithium ion batteries using SiO2-coated LiNi0.5Co0.2Mn0.3O2 microspheres as cathodes. J. Alloys and Comp. 2017, 709, 708-716.
85. Wan, G. J.; Huang, N.; Kwok, S. C. H.; Shao, Z. Y.; Zhao, A. S.; Yang, P.; Chu, P. K., Si-N-O films synthesized by plasma immersion ion implantation and deposition (PIII&D) for blood-contacting biomedical applications. Ieee Transactions on Plasma Science 2006, 34, (4), 1160-1165.
86. Jin, S. B.; Lee, J. S.; Choi, Y. S.; Choi, I. S.; Han, J. G.; Hori, M., Improving the gas barrier properties of a-SiOxCyNz film at low temperature using high energy and suitable nitrogen flow rate. Current Applied Physics 2013, 13, (5), 885-889.
87. Medeiros, H. S.; Pessoa, R. S.; Sagas, J. C.; Fraga, M. A.; Santos, L. V.; Maciel, H. S.; Massi, M.; Sobrinho, A.; da Costa, M., Effect of nitrogen content in amorphous SiCxNyOz thin films deposited by low temperature reactive magnetron co-sputtering technique. Surface & Coatings Technology 2011, 206, (7), 1787-1795.
88. Soraru, G. D.; Dallapiccola, E.; Dandrea, G., Mechanical characterization of sol-gel-derived silicon oxycarbide glasses. Journal of the American Ceramic Society 1996, 79, (8), 2074-2080.
89. Garcia, A. R.; Clausell, C.; Barba, A., Oxynitride glasses: a review. Boletin De La Sociedad Espanola De Ceramica Y Vidrio 2016, 55, (6), 209-218.
90. Tsai, T. Y.; Shen, Y. H.; Tu, S. L.; Su, Y. H.; Huang, C. C., The effects of UV curing on silicon oxycarbide films. Optical and Quantum Electronics 2016, 48, (11), 484.
91. StorgaardLarsen, T.; Leistiko, O., Plasma-enhanced chemical vapor deposited silicon oxynitride films for optical waveguide bridges for use in mechanical sensors. Journal of the Electrochemical Society 1997, 144, (4), 1505-1513.
92. Baggetto, L.; Charvillat, C.; Esvan, J.; Thébault, Y.; Samélor, D.; Vergnes, H.; Caussat, B.; Gleizes, A.; Vahlas, C., A process-structure investigation of aluminum oxide and oxycarbide thin films prepared by direct liquid injection chemical vapor deposition of dimethylaluminum isopropoxide (DMAI). Chem. Vap. Dep. 2015, 21, 343-351.
93. Krumdieck, S.; Davies, S.; Bishop, C. M.; Kemmitt, T.; Kennedy, J. V., Al2O3 coatings on stainless steel using pulsed-pressure MOCVD. Surf. Coat. Technol. 2013, 230, 208-212.
94. Lee, D.; Krumdieck, S.; Talwar, S. D., Scale-up design for industrial development of a PP-MOCVD coating system. Surf. Coat. Technol. 2013, 230, 39-45.
95. Vahlas, C.; Alford, N.; Basista, M.; Borg, A.; Bressler, P.; Conde, J. P.; Dürig, U.; Grimmeiss, H.; Heutz, S.; Jarvis, D. J.; Olsson, E.; Dolabella Portella, P.; Priolo, F.; Quandt, E.; Ritschkoff, A. C.; Schorr, S.; Van Houtte, P. Materials Science and Engineering in Europe: Challenges and Opportunities. Science position paper; Strasbourg, 2013; p 23 pages.